Canon Moves to Challenge ASML In Chipmaking Equipment

Canon is preparing to challenge Dutch company ASML with a new generation of nanoimprint lithography (NIL)....
Canon Moves to Challenge ASML In Chipmaking Equipment
Written by WebProNews
  • Canon is preparing to challenge Dutch company ASML with a new generation of nanoimprint lithography (NIL).

    ASML currently has a stranglehold on the lithography machines used to etch circuits onto chips. According a press release, Canon has released the “FPA-1200NZ2C nanoimprint semiconductor manufacturing equipment.”

    Canon says its nanoimprint lithography (NIL) technology will soon be able to pattern 2nm chips:

    Canon’s NIL technology enables patterning with a minimum linewidth of 14 nm2, equivalent to the 5-nm-node3 required to produce most advanced logic semiconductors which are currently available. Furthermore, with further improvement of mask technology, NIL is expected to enable circuit patterning with a minimum linewidth of 10 nm, which corresponds to 2-nm-node.

    Canon clearly hopes to regain ground in the semiconductor industry and its new NIL technology may well be the key to doing that.

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